ICT

A simple process to manufacture devices from MoS2 and WS2, using chemical vapour deposition (CVD).

Applications Include:

These materials offer an exciting alternative to graphene, as they possess a band gap, crucial for applications in electronics and photonics. They can also be used in chemical sensing applications as gas sensor devices produced in this manner display ultra-high sensitivities, down to 400 ppb for ammonia.

We have developed a novel material showing p-type semiconducting properties while maintaining good transmission in the visible range. Electrical and optical properties are on par or superior to other known p-type oxides such as delafossite CuAlO2.

Applications Include:

Transparent displays, solar cells, hole injectors for OLED devices and transparent lighting.

A new ferromagnetic material Mn2Ga has been developed to address the requirement for high density bit patterned perpendicular recording medium in hard disk drives.

Mn2Ga has a great potential to fill the need for recording densities up to 10 Tbit per square inch with 10 year thermal stability, and can be deposited with deposition equipment that is already available in industrial facilities.

Applications Include:

Bit-patterned recording mediums, magnetic random access memories (MRAMs) and hard bias materials (actuators, transducers, etc.).

Nano electro-mechanical systems (NEMS) are of interest in high frequency, low power switching, alternative circuitry and sensors

Applications Include:

High frequency resonators,ultrasensitive sensors: chemical, biological, motion, acceleration, portable power generation (Energy harvesting), imaging, transistors/switches,resonators for radio and microwave frequencies

A new type of vertical memory where each layer encodes information in two degrees of freedom, which has the potential to increase the theoretical storage capacity by factor 4(n-1).

Applications Include:

High capacity data storage and applications where moderate amounts of storage with a need for very frequent updates are required.

This technology uses magnetically enhanced electrolysis to produce patterns on magnetic materials without the need for a mask.

Applications Include:

Patterned metal plating/coating of thin layers for use in the semiconductor and coatings sectors.

Diamond patterning technology developed in CRANN enables high resolution nano-scale engraving on to the surface of diamond.

This facilitates a wide range of applications specific to diamond in a simple cost-efficient method for the first time.

Applications Include:

Patterned metal plating/coating of thin layers for use in the semiconductor and coatings sectors.

Providing a simple, cost effective approach to make equally spaced periodically ordered uniform size inorganic oxide nanostructures on different substrates for high technology applications.

The technology is based upon two related things, firstly using modified polymers as hard masks and secondly, the assembly of block copolymers on hard mask materials.

Applications Include:

Bottom-up self-assembly of nano-scale structures. The main application of this technology lies within the manufacture of sub-16 nm logic circuitry (for computer processors) and copper Interconnects for memory devices.

Unique manufacture method to create nanowires in known locations.

Applications Include:

Electronic interconnects, light harvesting and bio sensors.

Enables the use of HSQ as an EBL resist on germanium wafers, thereby allowing the fabrication of miniaturised germanium high speed devices having high density nano-scale features.

Applications Include:

Electronic interconnects, light harvesting and bio sensors.

This novel manufacturing method allows for production of uniformly shaped custom three-dimensionally sculptured nano-structures (helices, zig-zags, etc.) made from metals and high surface mobility materials.

Applications Include:

Sensing, communications, optical devices, energy harvesting and enhanced light adsorption for solar technologies.

We have developed a carbon-silicon Schottky diode that has outstanding electrical performance and high temperature stability which helps to increase the peak current compatibility.

Applications Include:

Devices in the ICT sector or any high temperature electronics applications including; power semiconductor devices, switching devices, high temperature electronics and high frequency devices.

This OSNR measurement device provides a cost-effective and robust solution to the in-band OSNR monitoring problem.

Impairments to the signal incurred from the network such as chromatic dispersion, polarization mode dispersion, additional filtering, etc, will not influence the function of the module.

Applications Include:

Optical telecommunications. ONSR is a key parameter for future high speed and transparent optical networks.