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You are here Instrumentation > Focused Ion Beam (FIB) Technologies > Zeiss AURIGA Focused Ion Beam

Zeiss AURIGA Focused Ion Beam

The Carl Zeiss Auriga Focused Ion Beam (FIB) system is a versatile microscope tool for failure analysis, construction analysis, investigating embedded particles and features, implanting and deposition of selected materials and for in-situ TEM sample prep. The FIB is used widely in various industries such as semiconductor, ICT and medical devices. It is also used within academia and is having an impact in geology, mechanical, bone and biological disciplines. The FIB technique of cross sectioning is comparable to “key-hole” surgery for materials. < /br> The system has a Gallium based ion beam column along with a field emission SEM column, together they are often referred to as a dual beam system. The FIB is used to cut and the SEM to view and it also has live milling capability. The FIB can also be used to image and is especially useful for grains structure analysis due to ion channelling. The FIB can be used to mill into samples in a controlled manner or deposit platinum or tungsten metal lines. The Zeiss FIB also has a low kV energy capability which helps to minimize any damage to samples especially for TEM sample prep. There is a Raith based system installed on the system for Ion beam Lithography techniques.

Technical Specifications

  • GEMINI® FESEM column capable of 1 nm resolution at 15 kV.
  • Accelerating voltage range from 0.2 kV – 30 kV
  • Ion column technology with ~3 nm resolution
  • Ion beam currents range from 0.5 pA – 40 nA
Zeiss AURIGA Focused Ion Beam