The nature of the Argon beam itself reduces the likelihood of implantation in the sample, rendering a cleaner image following examination under TEM. Capable of accelerating potentials as low as 50eV, the 1040 NanoMill offers unparalleled control over the ions produced in the system.

It also features a liquid nitrogen cooling system to ensure that temperature sensitive specimens can be milled without fear of degradation.

Technical Specifications

  • Ion beam currents range from 0.1 - 300µA
  • Secondary Electron (SE) detector
  • Accelerating voltage range from 50eV-2000eV