Zeiss SUPRA 40

The Supra’s GEMINI® FESEM column affords superb resolution down to 0.1 kV, a high efficiency In-lens SE detector, minimal adjustments when changing operating voltage and low magnetic fields at specimen level.< /br> A high-speed Raith beam-blanker/controller enables users to perform resist-based lithography of CAD designs.

Technical Specifications

• GEMINI® FESEM column capable of 1 nm resolution.
• Raith Quantum™ high-speed beam blanker and software for precision electron beam lithography up to 30 kV.
• Bruker XFlash® 6|30 EDX and e-FlashHR EBSD detectors, for materials and elemental analysis
• The AML boasts a class 10000 cleanroom with fume hoods, wet bench, and spinners for resist based lithography.