Elionix ELS 7700
The Elionix ELS 7700 is a dedicated 75 kV electron beam lithography system. Equipped with a laser interferometer controlled stage, it is ideal for large area patterning as adjacent writefields may be seamlessly stitched together. Operating at 75 kV enables high precision lithography with reduced proximity effect.< /br> This is ideal for researchers looking to fabricate photonic waveguides, or other large area structures such as chess boards.
Technical Specifications
- Dedicated electron beam lithography system.
- FESEM column operating at 75 kV.
- Laser interferometer controlled stage enabling extremely precise X and Y movements.