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Deposition

Existing 'Shamrock' Sputtering Tool (TCD)

The Shamrock Deposition Tool at CRANN, TCD

The Shamrock tool is Capable of processing up to 6 inch wafers. It is a 6 target DC/RF sputter system of the type which has previously found wide use in Seagate research and development centres.

  • It is capable of processing up to 6 inch wafers
  • The system is fully automatic and has a maximum capacity of 16 wafers, and can deposit on up to 4 wafers in one process at ambient temperature due to its planetary turntable geometry
  • Processing several wafers at once allows for high target efficiency while maintaining low growth rate for smoother films
  • Typical deposition rates are less than 1 Å/s. The system currently comprises 3 deposition chambers; Chambers A, B and C with a load lock and a robotic transfer module.
  • Chamber A of the system has 6 DC sputter guns and an ion gun for substrate cleaning.
  • Chamber B has 6 DC sputter guns, 2 target-facing-target RF sputter guns and one normal incidence RF sputter gun.
  • Chamber C is an ultrahigh vacuum e-beam evaporation chamber with a low pressure sputtering source. The flexibility of the system allows for alloys of up to 6 targets to be sputtered with good compositional control.
  • An in-plane magnetic field can be used during deposition to set the magnetic easy axis of spin valve and tunnel junction samples, or other thin magnetic films.
  • Base pressures of the system vary from 1 10-7 Torr (for Chamber A), to 2 10-8 Torr (for Chamber B)

Trifolium Dubium -Developed by DCA Instruments, Finland, and SPECS, Germany

An Overview of the New Trifolium Dubium System

The tool will be installed in the CRANN clean room facility in the second half of 2018.

  • Up to 4" wafers
  • Fully automated sample transfer and processing
  • Will consist of four deposition chambers and one analytical chamber
  • Sputtering of metals and dielectrics. Two chambers, six magnetrons in each, arranged confocally, mix of DC/RF. Dielectrics chamber will include target-facing-target capability, reactive sputterin, natural and plasma oxidation/nitridation.
  • Pulsed laser deposition (PLD)
  • Molecular beam epitaxy (MBE)
  • X-ray photoelectron spectrometer (XPS)
  • RHEED analysis will be available in PLD and MBE chambers.
  • All deposition chambers will have high temperature stages, up to 1000 oC in oxygen
  • All chambers will be connected via a UHV central hub, with entrance via 10-wafer loadlock.

 

Magnetometry

DC Magnetometry (TCD)

MPMS XL5 Evercool

Quantum Design MPMS XL 5

Quantum Design PPMS - VSM Option

VSM - single axis, room temperature

VSM - 2 + 1 axis, room temperature

VSM - single axis, high temperature

VSM - single axis, low temperature

 

AC Magnetometry

Quantum Design MPMS XL 5 - homemade insert

Quantum Design MPMS XL 5 - homemade electronics

AC susceptometer - high temperature

AC Susceptometer - low temperature

 

Optical Magnetometry (TCD)

Dynamic Kerr Effect Setup

Kerr effect setup

Faraday effect setup

 

Electronic Transport (TCD)

Andreev Reflection

Oxford Instruments vapour flow through sample space cryostat

Multimag 1 T permanent magnet variable flux source

Electronics rack

Low-Tc SQUID current pre-amplifier

 

High Impendence

Quantum Design PPMS - Purpose-build two tri-axial sample access leads

Janis Research - Vapor flow through sample space cryostat with two tri-axial sample access leads

 

In-plane Microwave Dynamics Setup @ HZDR

In-plane Microwave DynamicsMicrowave Dynamics @ HZDR

Süss MicroTech PM5 Wafer Prober; GSG / GS picoprobes 0-40 GHz, 50 / 100 / 150 μm pitch; Magnetic field up to 0.6 T, full in-plane rotation; Optem CCD-Microscope; Agilent MXA spectrum analyzer (up to 26.5 GHz); Agilent MXG microwave generator (up to 40 GHz); Picosecond PulseLab pulser (0.25 - 10 ns, 55 ps risetime); Tektronix DPO72004 20GHz real-time oscilloscope; Keithley source meter / nanovoltmeter / lock-in amplifier; Labview automation

Full list of equipment available directly to HZDR-Deac group: https://www.hzdr.de/db/Cms?pNid=2667

 

THz Emission Spectroscopy at the TELBE laboratory, HZDR

TELBE Emission Spectroscopy

THz emission spectroscopy set-up in the TELBE lab in combination with a 10T cryomagnet.

 

End Station for THz control of Magnetic Order at TELBE, HZDR

THz End Station at TELBE

(a) The measurements can be performed in a commercial split-coil magnet system, providing sample temperatures between 3 and 300 K and magnetic fields of up to 10 T. Magnetisation dynamics can be probed on ultra-fast time-scales with a synchronized laser (green line) by transient MOKE and Faraday measurements with a temporal resolution down to few 10ns fs. Narrow-band Fourier-limited Carrier-envelope-phase pulses (CEP), stable THz pulses are provided as pump at a typical repetition rate of 100 kHz. (red line) (b) THz spectra of tifferent THz tunes of the TELBE undulator source (0.1 - 1.2 THz) with energies ot up to 2 μJ. (c) Waveplates allow for control of the THz radiation ploarisation state, between circular and linear.

S. Kovalev et al, J. Phys. D 2018, accepted

 

GHz and THz Reflectometry at Swissto12, EPFL

GHz Reflectrometry Facilities at St12

GHz VNA system with frequency extenders for MCK measurements

THz Spectroscopy Facility at St12

THz measurement facilities of SWISSto12 at EPFL

 

Computational Facilities, TCD

Computational Clusters @ TCD

The group has two clusters: Boyle with a compute capacity of 43TF and Parsons which operates at 11TF, shown above. Further information can be found here: https://www.tchpc.tcd.ie/resources/clusters

 

Contact: stamenov.plamen@tcd.ie
Last updated: Feb 11 2018.
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