Electrodeposition is a useful
technology for producing metallic films. Magnetic fields have suprising
effects on the morphology and rate of growth of electrodeposition,
which we investigate using numerical simulation and carefully designed
experiments.
Mass Transport
A magnetic field is found to enhance the current density j
in the deposition of metals like Cu with a B1/3 variation.
This is a consequence of the Lorentz force j x B
which induces bulk convective flow, narrowing the diffusion layer
at the cathode. The effect is modelled numerically using the finite
element hydrodynamics package FLUENT.
Morphology
A magnetic field has a dramatic influence on the
morphology of 2D fractal electrodeposits shown below. This has
been modelled by adapting ‘diffusion limited aggregation’
(DLA) to take account of electric and magnetic fields, gravity
and concentration.
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No
field |
Field
out of page |
Field
into page |
Field
in plane |
New Alloys
Electrodeposition
is used industrially to produce the permalloy (Fe20Ni80)
write-head for hard disks. There is a search for new soft
ferromagnetic electrodeposited alloys with a much higher polarisation
than permalloy. Pulsed electrodeposition is also a way of
producing atomic-scale magnetic multilayers.
Hard magnets such as CoPt, FePt are electroplated for applications
involving microdevices. Electroplating providing lower cost
than many alternative techniques, such as sputtering or MBC |
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