Undergraduate Course - Course overview
Nanoscience - Physics and Chemistry of Advanced Materials (N-PCAM) is a four-year degree programme, run jointly by the Schools of Chemistry and Physics at Trinity College Dublini and aided by the investigators and facilities of the Centre for Research in Adaptive Nanodevices and Nanostructures (CRANN). Students will gain a deep and lasting understanding of the science of advanced materials that underpins the nano revolution. Some laboratory training is provided in CRANN, the leading institute for nanoscience in Ireland (www.crann.tcd.ie). This degree programme will equip students to work across a diverse range of industries that employ nanotechnology. The course provides a solid foundation in Chemistry, Physics and Mathematics for the first two years and specialises in nanoscience for the final two years.Course overview - Freshman years
In the Freshman years a student studying Nanoscience, Physics and Chemistry of Advanced Materials takes the full course in Physics, Chemistry and Mathematics as well as special topical tutorials in Nanoscience The freshman students in each year are managed by their respective course coordinators for each year in the Schools of Physics and Chemistry.Nanoscience tutorials - Freshman years
The details of the current Freshman tutorials in nanoscience are listed here. (TCD access only)Course overview - Sophister years
Nanoscience, Physics and Chemistry of Advanced Materials is a moderatorship taught jointly by the Schools of Physics and Chemistry. The Sophister course booklet is available here:- JS Course Booklet PCAM 2012-13 (PDF) This has information on updated progression regulations from JS for 2012-2013.
Course overview - Junior Sophister year
In the Junior Sophister year a student studying Nanoscience, Physics and Chemistry of Advanced Materials takes specific parts of the Moderatorship courses in Physicss and in Chemistry that are relevant to Nanoscience and Advanced Materials. In addition the student is trained in experimental laboratory aspects of Nanoscience, Physics and Chemistry of Advanced Materials in a dedicated laboratory setting. For students completing the JS year in 2012-2013 (and later) the JS marks contribute to 35% of the final degree mark.Course overview - Senior Sophister year
In the Senior Sophister year a student studying Nanoscience, Physics and Chemistry of Advanced Materials partakes in a 12 week independent research project at an internationally recognised laboratory that specialises in aspects of nanoscience, advanced materials or semiconductor processing - typically outside of TCD. Students take the Moderatorship lecture modules relevant to Nanoscience and Advanced Materials from the Schools of Physics and Chemistry. For students completing the JS year in 2011-2012 (and earlier) the JS marks contribute to 20% of the final degree mark.Assessment and Examination Procedures
In each year students are assessed by a combination of continuous assessment practical work, problems and annual end-of-year examinations. Modules in Physics and in Chemistry are examined according to the rules of the respective schools.Final Degree Award - B.A. (Moderatorship) in Nanoscience, Physics and Chemistry of Advanced Materials
The final Moderatorship degree mark is a weighted combination of the year end mark in the SS year and the JS year. In the Senior Sophister year a special examination paper on scientific comprehension and problem solving ability together with assessment of the 12 week long research project contributes 25 ECTS of the 60 available in the ratio 30:70, respectively.Local information for registered Nanoscience, Physics and Chemistry of Advanced Materials students
Follow this link for local information for registered undergraduates. (TCD access only)
Last updated: Jan 10 2013. | back to top
CRANN Advanced Microscopy Laboratory (AML) is a custom built, state of the art 6,000 square foot facility )
This_cleanroom is equipped to produce device structures on wafers up to 150mm in diameter. The specification is from class 100 in the lithography area to class 10000.
This_cleanroom is equipped to produce device structures on wafers up to 150mm in diameter. The specification is from class 100 in the lithography area to class 10000.