Course Material - Junior Sophister Syllabus
In their fourth year students taking the Advanced Materials Moderatorship (Degree) course take all of the following lecture courses:
- CH4009 Solid State
- CH4022 Matter Transport in Solids
- CH4027 Structural Chemistry
- CH4061 Organic Polymer Materials
- CH4062 Inorganic Materials
- CH4063 Simulation Techniques in Solids
- CH4064 Photochemistry and Materials
- PY4P03 Condensed Matter II
- PY4P04 Nanoscience
- PY4P06 Photonics
- PY4P07 Advanced Topics
- ME4061 Polymer Composite Materials
Students are required to undertake an original research project, ideally in an industrial laboratory, during Michaelmas term of the Senior Sophister year. Students are strongly encouraged to do their projects in an academic or industrial research lab outside Ireland. In many cases students travelling abroad will be expected to begin their project in July or August and work through until December. In some cases, placements abroad are funded. To travel abroad students must achieve an overall grade of 50% in JS. In the past, destinations have included California, New Zealand and Australia. Students who are ineligible to take up a placement outside College on the basis of Junior Sophister grade must undertake an original research project in a College laboratory during the period September to December of Senior Sophister year.
A project report must be submitted on the first day of Hilary Term and students are required to give a poster presentation on their project in Trinity Term. Click here for project marking scheme.
Students are required to attend a selection of seminars from the Physics and Chemistry seminar series during Hilary term. Timetable
PY4063 Tutorials
Students are required to attend tutorial classes associated with individual courses.
Last updated: Nov 03 2010. | back to top
CRANN Advanced Microscopy Laboratory (AML) is a custom built, state of the art 6,000 square foot facility )
This_cleanroom is equipped to produce device structures on wafers up to 150mm in diameter. The specification is from class 100 in the lithography area to class 10000.
This_cleanroom is equipped to produce device structures on wafers up to 150mm in diameter. The specification is from class 100 in the lithography area to class 10000.